We are proud to announce a new experimental residency created by ArtSlant in collaboration with Chashama.
Process Park is a funded four-week residency for 3-4 artists at chaNorth Artist Residency in Pine Plains, NY, the goal of which is to learn to live and work better through a process-oriented approach to art making and existing. The residency will conclude with an exhibition/symposium in New York that will be conceived and planned as a group during the residency.
The Spring 2018 residency runs April 1–April 29. Application deadline: February 18, 2018.
Process Park is designed to foster an engaged community through developing engaged individuals. Artists and cultural producers need space and time to interrogate and refine the ways they work and create while retaining a sense of amateurism. To this end, Process Park encourages research and play. Through knowledge-sharing, making, and experimentation, this residency aims to generate deeper connections between people and the visual and material culture they consume.
Process Park focuses on reinserting ourselves into the act of production, to interrupt the paradigm of contemporary alienation. Residents will be encouraged to develop a stronger relationship to the food we eat, the images we ingest, and the omnipresent algorithms that fundamentally shape our lives. Process Park pushes back on throw-away consumption.
We ask participants to bring knowledge to share and a willingness to learn from the residency’s facilitators, visitors, and co-residents. The emphasis will be on learning through doing. The goal is not only to share knowledge useful in art making but to share knowledge which will be useful in the practice of everyday life. Intensives take the form of teaching or learning the basics of a given skill in a day. Residents will practice those skills throughout the duration of the residency to incorporate that new knowledge into their lives.
If we create what supports and sustains us and our practices, our investment in the world is made richer, deeper.
Process Park includes Room & Board for four weeks, educational intensives, and an exhibition/symposium in NYC. Residents are encouraged to continue their own practices during the residency but are expected to participate in courses and scheduled group meals and events.
Who: All artists, cultural producers, writers, musicians, programmers, and researchers, 21+, looking to enrich their relationship with a mode of production are welcome to apply.
Course Proposal: Residents will lead an intensive, one-day course, sharing a skill of their choice with other residents. This skill can be part of your practice or not. You don’t need to be an expert but should feel comfortable enough that you can assist people in exploring a given area of knowledge. Your course proposal should be a brief description of the skill you want to teach, and how (max 250 words) and be entered into the field “Statement of Intent” on the application page.
Current intensives available by residency facilitators for Spring 2018 include planting, pickling, fermentation, basic HTML, felting, podcasting, clay-refinement, digital publishing, kiln and oven construction, and baking. Further intensives will be proposed and offered by residents.
Statement of Intent: Following your course proposal, your statement of intent should introduce your practice and provide a connection between your practice and what you hope Process Park will allow you to achieve within its unique parameters. Discuss what you will gain from this experience and what you can bring to the group’s dynamic. How would a process-based approach inform your practice going forward? How do you envision using your time at Process Park? (max 500 words)
Please also include contact information for two references and your CV.
You must apply using your ArtSlant Profile. Sign up here if you don't have one already. Use your profile to include supporting images or texts for your application. An application fee of $25 will be required to submit your application. The fee goes to the operating costs of the residency.